Proses Deep Etching Material Kuningan

Abstract

Deep etching has been developed as one of the micromachining techniques used to fabricate small appliances such as robotic components for medical applications. An electric energy is sometimes used to accelerate the etching process. The objective of this work was to study the effect of electrical current on the material removal rate and wall profiles in the deep etching process of brass. The etching solution was composed of ferric chloride and aquadest, whereas the variations of electrical current for the etching were 0.09 A, 0.12 A, 0.15 A, 0.30 A, and 0.35 A. The result showed that the increase of the electrical current increased the etched mass. The increase of the material removal rate obtained from the experiment was close to that obtained from the theoretical calculation. The experimental result showed more detailed information of the etched wall profile, where an increase in the electrical current increased the surface depth, and the side wall tent to form a curve shaped with the same radii.