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| dc.description.abstract | The objective of this work was to investigate the effect of electrical current on the material removal rate an d wall profile in the deep etching process of aluminum alloy. The etching solution was composed of na trium chloride, copper sulfate and aquadest, whereas the current variations used for the etching were 0, 1.6, 2.1, 3, 3.5 and 5 Ampere. The result shows that the etched mass increased as the increase of the current. However, the material removal rate ob tained from the experiment increased more gradually compa red with that obtained from the theoretical calculation . The micrograph of the wall profile shows that an increase in the current has increa sed the su rface depth, an d the side wall tent to fo rm a curve shap ed with the same ra dii. | in_ID |
